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DFG8830 Scheda tecnica(PDF) 2 Page - DISCO Corporation

Il numero della parte DFG8830
Spiegazioni elettronici  Fully Automatic Grinder
PDF  2 Pages
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Produttore elettronici  DISCO [DISCO Corporation]
Homepage  https://www.disco.co.jp
Logo DISCO - DISCO Corporation

DFG8830 Scheda tecnica(HTML) 2 Page - DISCO Corporation

  DFG8830 Datasheet HTML 1Page - DISCO Corporation DFG8830 Datasheet HTML 2Page - DISCO Corporation  
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Fully Automatic Grinder
DFG8830
DFG8830 Operation flow
[1] The robot pick removes the wafer from the cassette and places it on the
positioning table, where centering takes place.
[2] The transfer arm places the wafer on the chuck table.
[3] - [6] Grinding
[7] The transfer arm removes the wafer from the chuck table and places it
on the spinner.
[8] Cleaning and drying
[9] The robot pick returns the workpiece to the cassette.
Specification
Environmental conditions
• Use clean, oil-free air at a dew point of -15 °C or less. (Use a residual oil: 0.1 ppm. Filtration rating:0.01 μm/99.5 % or more).
• Keep room temperature fluctuations within ±1 °C of the set value. (Set value should be between 20 - 25 °C).
• Keep grinding water and cleaning water + 0 - 2 °C above room temperature (fluctuations within 1 °C over one hour).
• Keep spindle cooling water temperature between 20 - 25 °C (fluctuations within 2 °C over an hour).
• The machines should be used in an environment, free from external vibration. Do not install machine near a ventilation opening, heat generation equipment or oil mist generating parts.
• This machine uses water.
• In case of water leakage, please install the machine on the floor with sufficient waterproofing and drainage treatments.
* All the pressures are described using gauge pressures.
* The above specifications may change due to technical modifications. Please confirm when placing your order.
* For further information please contact your local sales representatives.
Unit
-
φ 4” –φ 6”
-
φ 5” –φ 8”
In-feed grinding with wafer
Rotation
mm
φ 300 Diamond Wheel
Rated Output
kW
6.3
Rated torque range
min
-1
1,000 - 4,000
Thickness variation
within one wafer
3 or less
Thickness variation
between wafers
±3 or less
mm
1,400 × 2,500 × 2,000
kg
Approx.6,000
µm
Specification
Wafer Diameter
Substrate Diameter
Grinding Method
Grinding Wheels
Spindle
Machine weight
Grinding
Accuracy
Machine dimensions(W×D×H)
www.disco.co.jp
2017.12



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