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C1226 Scheda tecnica(PDF) 2 Page - IMP, Inc

Il numero della parte C1226
Spiegazioni elettronici  CMOS 1.2um 100V CMOS, Double Metal - Double Poly
PDF  2 Pages
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Produttore elettronici  IMP [IMP, Inc]
Homepage  http://www.ds-imp.com.cn/index.asp
Logo IMP - IMP, Inc

C1226 Scheda tecnica(HTML) 2 Page - IMP, Inc

  C1226 Datasheet HTML 1Page - IMP, Inc C1226 Datasheet HTML 2Page - IMP, Inc  
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70
C1226-11-01
Min Channel Width
4.0
µm
Diffusion Overlap of Contact
1.0
µm
Min Spacing, Active Region, 5V
2.0
µm
Poly Overlap of Contact
1.0
µm
Poly1 Width/Space
1.5/2.0
µm
Contact to Poly Space
1.5
µm
Poly2 Width/Space
3.0/2.0
µm
Metal-1 Overlap of Contact
1.0
µm
Contact Width/Space
1.5/1.5
µm
Minimum Pad Opening
65x65
µm
Via Width/Space
1.5/1.5
µm
Minimum Pad to Pad Spacing
5.0
µm
Metal-1 Width/Space
2.5/1.5
µm
Minimum Pad Pitch
80
µm
Metal-2 Width/Space
2.5/1.5
µm
Diffusion & Thin Films
Symbol
Minimum
Typical
Maximum
Unit
Comments
Starting Material p<100>
Well (field) Sheet Resistance
ρ
N-well(f)
1.0
1.7
2.4
K
Ω/
n-well
N+ Sheet Resistance
ρ
N+
20
35
50
Ω/
N+ Junction Depth
xjN+
0.3
µm
P+ Sheet Resistance
ρ
P+
60
110
150
Ω/
P+ Junction Depth
xjP+
0.3
µm
High-Voltage Gate Oxide Th
HTGOX
24
nm
Gate Oxide Thickness
TGOX
24
nm
Interpoly Oxide
IPOX
33.6
42.0
50.4
nm
Gate Poly Sheet Resistance
ρ
POLY1
30.0
Ω/
Metal-1 Sheet Resistance
ρ
M1
45
m
Ω/
Metal-2 Sheet Resistance
ρ
M2
29
m
Ω/
Passivation Thickness
TPASS
200+900
nm
oxide+nit.
High Voltage Section Rules
Layout Rules
Physical Characteristics
Process C1226



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